Overview

At IMS we already use the third generation of e-beam writer for patterning of high resolution and complex structures.

E-beam writer Vistec SB352 HR

The present e-beam writer Vistec SB352 HR and the infrastructure at IMS enable structure generation with different sizes on wafers and quartz substrates.












E-beam lithography is used at IMS to develop and manufacture advanced masks, micro-mechanical and optical elements as well as for direct writing of CMOS circuits.

Hamatech Resist Track for 150 – 300 mm wafers

Components, technologies and processes are developed in close cooperation with our customers and the industrial level of the IMS product line makes the high quality manufacturing of the developed components possible.

For more information on the Single process steps, please go to Fields of activity - Technology services

Oerlikon Mask Etcher

Contact

For further information, please contact: Mathias Irmscher