DOEs are fabricated using standard photomask quartz blanks according to the SEMI specifications 6025 or 9035. The design can be structured with tight tolerances in terms of linewidth and etch depth across the entire plate. Multi-tier patterning, for example for the approximation of analog quartz profiles, can be realized, as well. Finally, technologies are available to cut down the substrates and give them the final form factor according to customer’s requirements.