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SPIE Advanced Lithography 2021

February 22 - 27, 2021

The IMS is represented with a lecture at the SPIE Advanced Lithography 2021 in San Jose, USA.

Session 6: Novel Resist Concepts and Track Processes

„Multidimensional process optimization of a negative e-beam photoresist for silicon-waveguide manufacturing“
Markus Greul, Holger Sailer, Mathias Kaschel, Joachim N. Burghartz

The presentation will be available for viewing the entire week of 22 - 26 February 2021.

For further information on the MOS-AK workshop, please go the following website:

Location: San Jose, California, United States, Digital Forum, Online Only