SPIE Advanced Lithography 2021
February 22 - 27, 2021
The IMS is represented with a lecture at the SPIE Advanced Lithography 2021 in San Jose, USA.
Session 6: Novel Resist Concepts and Track Processes
„Multidimensional process optimization of a negative e-beam photoresist for silicon-waveguide manufacturing“
Markus Greul, Holger Sailer, Mathias Kaschel, Joachim N. Burghartz
The presentation will be available for viewing the entire week of 22 - 26 February 2021.
For further information on the MOS-AK workshop, please go the following website: https://spie.org/conferences-and-exhibitions/advanced-lithography?SSO=1
Location: San Jose, California, United States, Digital Forum, Online Only