News
 

Current news - Archive

SPIE Photomask Technology 27th Annual Symposium (BACUS 2007)

September 17 - 21, 2007


Lecture: Marcus Pritschow

Fabrication of nano-imprint templates for Dual-Damascene applications using a high-resolution varable shape e-beam writer

Marcus Pritschow, Joerg Butschke, Mathias Irmscher, Holger Sailer, Institut für Mikroelektronik Stuttgart (Germany); Doug Resnick, Ecron Thompson, Molecular Imprints, Inc



Poster Session: Jörg Butschke

Resistless mask structuring using an ion multi-beam projection pattern generator

Joerg Butschke, Mathias Irmscher, Florian Letzkus, Institut für Mikroelektronik Stuttgart (Germany); Hans Loeschner, IMS Nanofabrication AG (Austria); Lorenz Nedelmann, Institut für Mikroelektronik Stuttgart (Germany); Elmar Platzgummer, IMS Nanofabrication AG (Austria)


For more information, please go to https://spie.org/photomask.xml

Location: Monterey, CA, USA