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IMS CHIPS at SPIE Advanced Lithography 2008

February 24 - 29, 2008

High resolution nanoimprint templates for dual damascene applications will be the focus of a presentation held by Dr. Mathias Irmscher at the semiconductor lithography industry's most important technical event in San Jose.

The Institut für Mikroelektronik Stuttgart (IMS CHIPS) is substantially supporting research and development activities in the field of advanced lithography for the manufacturing of microchips. Nanoimprit templates applications are a promising perspective for next generation lithography.

The Presentation
"High Resolution Nanoimprint Templates for Dual Damascene – Fabrication and Imprint Results "

The Authors
Mathias Irmscher, Joerg Butschke, Corinna Koepernik, Lorenz Nedelmann, Marcus Pritschow, Christian Reuter, Holger Sailer, IMS Chips, Stuttgart, Germany;
Jordan Owens, Ken Sotoodeh, Ron Carpio, Bruce Wilks, Jeff Wetzel, ATDF Inc. Austin, TX, USA;
Brook Chao, Frank Palmieri, Wei-Lun Jen, C. Grant Willson, University of Texas, Austin, TX, USA.


For further information, please go to spie.org/advanced-lithography.xml

Location: Convention Center, San Jose, California, USA