High resolution nanoimprint templates for dual damascene applications will be the focus of a presentation held by Dr. Mathias Irmscher at the semiconductor lithography industry's most important technical event in San Jose.
The Institut fÃ¼r Mikroelektronik Stuttgart (IMS CHIPS) is substantially supporting research and development activities in the field of advanced lithography for the manufacturing of microchips. Nanoimprit templates applications are a promising perspective for next generation lithography.
"High Resolution Nanoimprint Templates for Dual Damascene â€“ Fabrication and Imprint Results "
Mathias Irmscher, Joerg Butschke, Corinna Koepernik, Lorenz Nedelmann, Marcus Pritschow, Christian Reuter, Holger Sailer, IMS Chips, Stuttgart, Germany;
Jordan Owens, Ken Sotoodeh, Ron Carpio, Bruce Wilks, Jeff Wetzel, ATDF Inc. Austin, TX, USA;
Brook Chao, Frank Palmieri, Wei-Lun Jen, C. Grant Willson, University of Texas, Austin, TX, USA.
For further information, please go to