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SPIE Photomask Technology 28th Annual Symposium (BACUS 2008)

October 06 - 10, 2008

Lecture: Marcus Pritschow a

Evaluation of E-Beam Repair for Nanoimprint Templates

Volker Boegli b, Joerg Butschke a, Mathias Irmscher a, Douglas Resnick c, Holger Sailer a, Kosta Selinidis c, Ecron Thompson c
a IMS Chips, Allmandring 30a, D-70569 Stuttgart, Germany
b NaWoTec GmbH – A Carl Zeiss SMT Company, Industriestr. 1, D-64380 Rossdorf, Germany
c Molecular Imprints, Inc. 1807-C W. Braker Lane, Austin, TX 78758, USA


Lecture: Jörg Butschke a

Mask patterning for the 22nm node using a proton multi-beam projection pattern generator

Mathias Irmscher a, Holger Sailer a, Hans Loeschner b, Lorenz Nedelmann a, and Elmar Platzgummer b
a IMS Chips, Allmandring 30a, D-70569 Stuttgart, Germany
b IMS Nanofabrication AG, Schreygasse 3, A-1020 Vienna, Austria


Lecture: Florian Letzkus a

Deflection Unit for Multi-Beam Mask Making

Joerg Butschke a, Mathias Irmscher a, Michael Jurisch a, Elmar Platzgummer b
a IMS Chips, Allmandring 30a, D-70569 Stuttgart, Germany
b IMS Nanofabrication AG, Schreygasse 3, A-1020 Vienna, Austria


For more information, please go to https://spie.org/photomask.xml

Location: Monterey Marriott and Monterey Conference Center, CA, USA