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IISB Lithography Simulation Workshop

September 18 - 20, 2008

The IMS will be giving a presentation at the "6th Fraunhofer IISB Lithography Simulation Workshop" in Athens.

Presentation Holger Sailer, September 19, 2008
"Determination of proximity effect correction parameters for fabrication of nanoimprint templates using variable shaped beam lithography"

For further information, please go to

Location: Hilton Hotel Athens, Greece
Time: 9.00 am