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Poster Award at the SPIE Photomask Conference 2008 in Monterey, USA

October 10, 2008

At this year SPIE Photomask Conference Oct 6-10, 2008 in Monterey, CA, USA IMS Chips was granted two Poster Awards for best papers:

Highest award for the paper:

Deflection Unit for Multi-Beam Mask Making
author Florian Letzkusa, Joerg Butschkea, Mathias Irmschera, Michael Jurischa, Christof Kleinb, Wolfram Klinglera, Hans Löschnerb, Elmar Platzgummerb, Reinhard Springerb
aIMS Chips, Allmandring 30a, 70569 Stuttgart, Germany
bIMS Nanofabrication AG, Schreygasse 3, A-1020 Vienna, Austria

Second award for the paper:

Mask patterning for the 22nm node using a proton multi-beam projection pattern generator
author Joerg Butschkea, Mathias Irmschera, Holger Sailera, Lorenz Nedelmanna, Marcus Pritschowa, Hans Loeschnerb, and Elmar Platzgummerb
aIMS Chips, Allmandring 30a, 70569 Stuttgart, Germany
bIMS Nanofabrication AG, Schreygasse 3, A-1020 Vienna, Austria