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SPIE Advanced Lithography 2009

February 22 - 27, 2009

IMS CHIPS participates in the this year's SPIE Advanced Ltihography Conference in San Jose, California, presenting the NIL technology at the joint booth (booth no 116).

Besides, IMS CHIPS will be giving a talk
"Evaluation of the CD-SEM Vistec LWM90xx for line width measurement of nanoimprint templates"

Wednesday, 25 February, 2009

Marcus Pritschowa, Joerg Butschkea, Mathias Irmschera, Lidia Parisolib, Toshihide Obac, Toshimichi Iwaic, Takayuki Nakamurac

a IMS Chips, Allmandring 30a, D-70569 Stuttgart, Germany
b Vistec Semiconductor Systems GmbH, Kubacher Weg 4, D-35781 Weilburg, Germany
c Advantest Corporation, Otone R&D Center, 1-5, Shin-tone, Otone-machi, Kitasaitama-gun, Saitama 349-1158, Japan


For further information, please go to spie.org/advanced-lithography.xml

Location: Booth 116, Convention Center, San Jose, California, USA