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New Collaboration in the Nanoimprint Lithography Industry

January 27, 2009

The leading provider of stamps for nanoimprint lithography, NIL Technology, and IMS Chips, announced at the NILCOM meeting, January 8th, in Schaerding, Austria that they have started a collaboration on the fabrication of stamps for nanoimprint lithography (NIL) by combining their electron beam lithography (EBL) expertises.

Press release collaboration
NIL Technology - IMS CHIPS