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Photomask and NGL Mak Technology XVI

April 08 - 10, 2009

The IMS will be represented in a poster session at the Photomask and NGL Mask Technology XVI 2009 in the Japanese Yokohama.

Go Proton: Investigation on Mask Patterning for the 22nm hp Node using a ML2 Multi Beam System
Joerg Butschke, Mathias Irmscher, Holger Sailer, Hans Loeschner*, Elmar Platzgummer*,

IMS CHIPS, Stuttgart, Germany, * IMS Nanofabrication AG, Vienna, Austria



For further information, please go to www.photomask-japan.org

Location: Annex Hall, Pacifico Yokohama, Yokohama, Japan