With a runtime of 3 years the EXEPT project (EXtreme uv lithography Entry Point Technology Development) was launched on May 1st, 2009 in the frame of the European program CATRENE (Label CT301). In Germany the project is funded by the Federal Ministry of Education and Research (Bundesministerium für Bildung und Forschung).
The goal of the EXEPT project is to develop technologies, tools & infrastructure components as required for high volume EUV lithography for the 22nm node in 2012. EXEPT is accomplished by a European consortium consisting of more than 10 companies and research facilities.
The Institut für Mikroelektronik Stuttgart (IMS CHIPS) will develop the fabrication process for a new generation of diffractive optical elements (DOE) required for testing and manufacturing of highly precise EUV scanner optics.
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