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Micro Nano Engeneering – MNE 2009

September 28 - October 01, 2009

Lecture: H. Sailer

A fast evaluation method for high-resolution ebeam resist process optimization

A. Barcz, J. Butschke, M. Irmscher, S. Martens

IMS Chips, Allmandring 30a, D-70569 Stuttgart, Germany


For more information, please go to https://www.mne09.org

Location: ICC Ghent, Ghent, Belgium