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Again Paper Award at the SPIE Photomask Conference 2009 in Monterey, USA

December 07, 2009

The Multi Beam Consortium consisting of IMS Nanofabrication AG, IMS CHIPS and FhG ISIT was awarded a paper award during this year´s SPIE Photomask Conference in Monterey, USA, September 14th through 17th.

Third Place Best Paper Award

"Charged Particle Multi-Beam Lithography Evaluations for sub-16nm hp Mask Node Fabrication and Wafer Direct Write"

Elmar Platzgummera, Christof Kleina, Peter Joechla, Hans Loeschnera, Martin Wittb, Wolfgang Pilzb, Joerg Butschkec, Michael Jurischc, Florian Letzkusc, Holger Sailerc, Mathias Irmscherc

a) IMS Nanofabrication AG, Schreygasse 3, A-1020 Vienna, Austria

b) Fraunhofer Institute for Silicon Technology (ISIT), Itzehoe, Germany

c) Institute for Microelectronics Stuttgart (IMS CHIPS), Stuttgart, Germany