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Photomask and NGL Mask Technology XVII

April 13 - 15, 2010

The IMS will be represented in a poster session at the Photomask and NGL Mask Technology XVII 2010 in the Japanese Yokohama.

W-CMOS Blanking Device for Projection Multi-Beam Lithography

Michael Jurisch, Mathias Irmscher, Florian Letzkus, Elmar Platzgummer*, Christof Klein*, Hans Löschner*


IMS CHIPS, Stuttgart, Germany, * IMS Nanofabrication AG, Vienna, Austria



For further information, please go to www.photomask-japan.org

Location: Annex Hall, Pacifico Yokohama, Yokohama, Japan