Large equipment investments at IMS CHIPS â€“ new electron-beam writer forms the core of a worldwide unique infrastructure for low/mid volume production of complex nano structures.
IMS CHIPS recently placed an order for a new electron-beam writer from Vistec Electron Beam GmbH, Jena, Germany. This lastet generation writer exposes according to the throughput efficient variable shaped beam principle and is equipped with an air-bearing stage. This allows processing of a large variety of substrates with a minimum structure size down to 30 nm and below while performing at high positioning accuracy.
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