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Nano Patterning Facility for Low/Mid Volume Production

February 14, 2011

Large equipment investments at IMS CHIPS – new electron-beam writer forms the core of a worldwide unique infrastructure for low/mid volume production of complex nano structures.

IMS CHIPS recently placed an order for a new electron-beam writer from Vistec Electron Beam GmbH, Jena, Germany. This lastet generation writer exposes according to the throughput efficient variable shaped beam principle and is equipped with an air-bearing stage. This allows processing of a large variety of substrates with a minimum structure size down to 30 nm and below while performing at high positioning accuracy.

For further information, please go to our press release
new e-beam-writer.pdf

Location: Institut für Mikroelektronik Stuttgart, Allmandring 30a, Stuttgart