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SPIE Photomask Technology 31st Annual Symposium 2011

September 19 - 22, 2011

Thursday, September 22th, 2011; Session 24, New Mask Making and Alternatives II

Florian Letzkus
Si stencil masks for organic thin fi lm transistor fabrication (Invited Paper)
Jörg Butschke, Tarek Zaki, Harald Richter, Joachim N. Burghartz, Institut für Mikroelektronik Stuttgart; Hagen Klauck, Frederik Ante, Max-Planck-Institut für Festkörperforschung


For more information, please go to https://spie.org/photomask.xml

Location: Monterey Marriott and Monterey Conference Center, CA, USA