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BMBF Project ETIK Leads to Enhancement of EUV Lithography

August 30, 2012

Sponsoring of German Ministry of Education and Research unites experts' know-how about innovative technology.

Under the leadership of Carl Zeiss a new project has started, which is sponsored by the German Ministry of Education and Research (BMBF). This undertaking focuses on EUV lithography in which extreme ultraviolet (EUV) light is used to create the structures on microchips. This new technology will be ready for production at the end of the year and enable the manufacture of structures as small as 20 nanometers. The objective of the joint ETIK project (“EUV projection optics for 14 nm resolution”) now is to improve the resolution that can be achieved with EUV lithography to at least 14 nanometers.
IMS CHIPS is contributing powerful optical components to ensure the quality of the projection lens.

For more information on th joint ETIK project, please refer to the press release.