The ASML-lead European EXEPT project (“Extreme UV Lithography Entry Point Technology Development”) which is part of CATRENE clusters has been awarded the Innovation Award 2012 at the European Nanoelectronics Forum München
Within the scope of the project, the partners had developed the projection system required for the lithography process, together with the necessary infrastructure. The contributions of Carl Zeiss SMT GmbH (Oberkochen) included a more powerful projection lens, a highly flexible illumination system without loss of energy, and the high-accuracy measuring systems necessary for their qualification. IMS Chips (Stuttgart) supplied new optical elements for the precision measurement of the EUV mirror.
CATRENE Innovation Award 2012