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SPIE Photomask Technology 33rd Annual Symposium 2013

September 10 - 12, 2013

Poster Session: Tuesday 10 September and Wednesday 11 September, 2013

Stephan Martens
E-beam GIDC resolution enhancement technology in practical applications
Jörg Butschke, Holger Sailer, Institut für Mikroelektronik Stuttgart (Germany); Reinhard R. Galler, Michael Krüger, Martin Suelzle, EQUIcon Software GmbH Jena (Germany)


For more information, please go to https://spie.org/photomask.xml

Location: Monterey Conference Center and Monterey Marriott, Monterey, CA, USA