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13th International Conference on Nanoimprint and Nanoprint Technology 2014, Kyoto

October 22 - 25, 2014

The IMS will have 2 poster presentations on the NNT 2014 in Kyoto, Japan.

Poster Session: Thursday, October 23, 2014 (16:20-18:20)

Evaluation of The New Vistec SB4050VSB E-Beam Writer for Template Making
M. Irmscher, J. Butschke, S. Martens and H. Sailer, Inst. for Microelectronics Stuttgart (IMS CHIPS), Germany

Structure Placement Accuracy of Wafer Level Stamps for Substrate Conformal Imprint Lithography
R. Fader1, M. Förthner1, M. Rommel1, A.J. Bauer1, L.Frey1, M.A. Verschuuren2, J. Butschke3, M. Irmscher3, E. Storace4, R. Ji4 and U. Schömbs4,
1Fraunhofer Inst. for Integrated Systems and Device Technol.,Germany, 2Philips Corporate Technologies, The Netherlands, 3Inst. for Microelectronics Stuttgart (IMS CHIPS) and 4SUSS MicroTec Lithography, Germany

For more information, please refer to:

Location: ANA Crowne Plaza, Kyoto, Japan