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SeNaTe - Seven Nanometer Technology project launched

May 21, 2016

Institut für Mikroelektronik Stuttgart (IMS) is participating in the work packages lithography and mask infrastructure. The lithography work package plans the development of highly-precise diffractive optical elements (DOE) for the surface test of EUV mirrors while the IMS will be researching new concepts in mask architecture in the mask infrastructure work package.
The ECSEL project will be accompanied by a simultaneously running BMBF project.