Improvement of resolution achieved with EUV
The joint project ETIK (EUV-Projektionsoptik fÃ¼r 14-Nanometer-AuflÃ¶sung) headed by ZEISS has successfully been wrapped up. The focus was on EUV lithography which uses extreme ultraviolet (EUV) light to structure microchips. This joint project enabled Zeiss and six other German companies and research facilities to further improve EUV technology-induced resolution. With this development the project partners significantly contribute to semiconductor sector demands to make available ever smaller, more efficient and more inexpensive micro chips. This project is supported by Bundesministerium fÃ¼r Bildung und Forschung (BMBF) with 7 mio. Euros.
IMS CHIPS assured the quality of projection objectives by making optical power components available.
For further information on the ETIK joint project, please refer to Press release.