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Photomask Japan 2007

April 17 - 20, 2007

Paper
3D Template fabrication process for the Dual Damascene NIL approach
Joerg Butschke a, Mathias Irmschera, Douglas Resnick b, Holger Sailer a, Ecron Thompson b
a IMS Chips, Allmandring 30a, D-70569 Stuttgart, Germany
b Molecular Imprints, Inc. 1807-C W. Braker Lane, Austin, TX 78758, USA


Poster Session
Dry Etch Behaviour of Different TaN Absorber Layers for EUVL Mask Making
Florian Letzkus*a, Günther Hess b, Mathias Irmscher a, Konrad Knapp b, Markus Renno b, Eugen Röhrle a, Holger Seitz b

For more information, please go to www.photomask-japan.org

Location: Yokohama