In a ZIM-promoted project the IMS and the new start-up mi2-factory are joining together for technological processes on the high-energy ion implantation of SiC power semiconductors. The focus, however, is on the Stuttgart-based development of large-scale and high-precision Si membrane masks, so-called energy filter membranes.
The energy-filtered single-wafer ion implantation process was developed at mi2 factory and successfully applied in the manufacture of SiC power components.
The developmental focus at IMS CHIPS will be on the following topics in the next few years: yield, no defects, original wafer and stress-optimized layout.
Sponsor: AIF Projekt GmbH
Support code: ZF4429201GM7