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Nanoimprint Lithography - Project FANTASTIC

June 14, 2007

Nanoimprint Lithography is a prospective candidate as a Next Generation Lithography (NGL) tool in microelectronics. Due to its advantages in the resolution and cost efficiency it has been adapted into the Semiconductor Technology Roadmap (ITRS) tool at the 32 nm node and beyond.
The MEDEA+ FANTASTIC project addresses the development and assessment of UV Nanoimprint Lithography for high resolution and high throughput microelectronics applications. The project will investigate all aspects of the technology involved including imprint tools, template fabrication and CMOS integration.
IMS is responsible for the development of the nanoimprint template manufacturing process.

For further information, please visit www.fantastic-project.org