The user group Ion Implantation was founded in 1987, following the example of the GSVIUG (Greater Silicon Valley Ion Implant user group).
The user groups Hot processes and RTP emerged from the user group Ion Implantation. Since then, the meetings of the two groups have been held on two consecutive days. In the afternoon of the first day, the user meeting on Hot Processes and RTP takes place, and on the second day, the user meeting on ion implantation is held.
For further information, please go to Einladung_Nutzergruppentreffen_2019_Oktober.pdf