PanaMEA – Intelligent blood sugar level monitoring

The REACT-EU grant approved to Institut für Mikroelektronik Stuttgart financed under the European Regional Development Fund (ERDF) – Innovation and Energy Transition – during the funding period 2014 – 2020 is part of the European Union’s response to the COVID-19 pandemic by the Administrative Regulation ERDF – Expansion of Innovation Capacities – EVI 2014 – 2020 of the Ministry of Economics, Labor and Tourism.

The grant is awarded by way of partial financing for project funding for the Nanopatterning Cluster+ project.

The electron beam lithography system was purchased with the help of funds from the European Union to support crisis management in connection with the COVID-19 pandemic and its social consequences as well as the preparation of a green, digital and stable recovery of the economy (REACT-EU), handed out through the ERDF program Baden-Württemberg 2014-2020.

The Vistec SB255 electron beam lithography system enables automatic exposure of masks up to 7 inches and wafers up to 200 mm in diameter. The so-called shaped beam technique is used, in which any rectangles and 45° triangles with a maximum dimension of 2 µm x 2 µm can be exposed at once by electron-optical imaging of two apertures. This technique, in combination with “write-on-the-fly” and vector scan, enables significantly faster exposure of orthogonal and diagonal structures compared to point-beam recorders. Differently shaped structures are exposed in a correspondingly approximated manner. In addition, the system is equipped with the so-called cell projection. This allows for more complex design blocks with a maximum extension of 2 µm x 2 µm in the block to be exposed. Damit können auch komplexere Designblöcke mit einer maximalen Ausdehnung von 2 µm x 2 µm im Block belichtet werden. The gain in writing time achieved with this writing method enables the production of structural geometries that were not feasible with the previous system.